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Overview
SPIE Photomask Technology + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
Why Attend – 2022
The leading multidisciplinary meeting is focused on global breakthroughs and challenges within photomask technology and EUVL. This conference is where researchers and scientists gather to share latest advances across two conferences.
SPIE Photomask Technology is a global forum for scientists and engineers to present and discuss photomask design, fabrication, quality control, and applications in the semiconductor industry. Its co-location with the EUV Lithography Symposium in a single setting presents a unique opportunity to meet and share results, challenges, and potential solutions in the EUV and DUV worlds.
Attendees will be able to hear world-class speakers address hot topics and answer specific questions. They also can connect and explore important topics in depth at technical events designed to provide focused discussions and learning.
Special events are designed to help students gain knowledge about the industry, build important skills, and network with leaders in the field.
The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV technology and infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials. They address the main challenges associated with the extendibility of the technology to smaller dimensions.
Why Exhibit – 2022
At the premier technical meeting for mask makers, EUVL, and emerging technologies, exhibitors can showcase the newest products, innovations, and latest technologies.
The event helps connect researchers, scientists, engineers, and buyers with potential suppliers, while educating the community about new technical possibilities.
Organizer
SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies.
Serving 255,000 constituents from 183 countries, the not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.
Source: Event Website
Source : Event Website
Attendees
Exhibitors
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| Event Name | City | State | Atendance | Exhibitors | Date |
|---|---|---|---|---|---|
| SPIE Photomask Technology 2024 | Monterey | California | - | verified |
Sep 29, 2024 |
| SPIE Photomask Technology 2023 | Monterey | California | - | verified |
Oct 01, 2023 |
| SPIE Photomask Technology 2022 | Monterey | California | - | verified |
Sep 25, 2022 |
| SPIE Photomask Technology 2021 | Monterey | California | - | verified |
Sep 27, 2021 |
| SPIE Photomask Technology 2016 | - | - | Sep 12, 2016 | ||
| SPIE Photomask Technology 2015 | Monterey | California | - | - | Sep 29, 2015 |
| SPIE Photomask Technology 2014 | Monterey | California | - | - | Sep 16, 2014 |
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