SPIE Advanced Lithography Exhibition 2019

  • San Jose Convention Center, San Jose, California
  • Feb 24 - 28, 2019

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Why Attend

The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 40 years.

See the latest technology in advanced lithography:

  •  Etch Technology for nanopatterning
  •  Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET
  •  Metrology, inspection, OPC, and process control
  •  Design and manufacturing software
  •  Materials and chemicals
  •  Imaging equipment
  •  Lasers
  •  Resist materials and processing
  •  Nano-imprint
  •  IC and chip fabrication
  •  Nanoscale imaging

 

Exhibition Dates and Hours:

Tuesday 26 February 2019 | 10:00 am to 5:00 pm

Wednesday 27 February 2019 | 10:00 am to 4:00 pm

Source : Event Website

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